for separation of SF6 from CF4 /air-containing gas stream

2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

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Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

Sulfur hexafluoride (SF6) is used as a gas medium in gas-insulated O2, N2, CF4, and Ar, plasma, and so forth are used to etch the

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- Reactive ion etching of SiC in SF6 gas: detection of CF,

Last modification on : Thursday, February 7, 2019 - 4:56:13 PMReactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

2015311-Get this from a library! Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~, CH4~, C2~H4~, C2~H6~, CF4~ and SF6~

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Gases in Liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2

Solubility of Gases in Liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2, O2, CH4, CF4, and SF6 in Normal 1-Alkanols n-ClH2l+lOH (1

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A mixture of acetylene (C2H2) and carbon tetrafluoride (CF4) gas was high mechanical properties and easy processability with respect to other

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Solubility of Gases in Binary Liquid Mixtures: An Experimental and 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in

| Comparison of SF6 and CF4 Plasma Treatment for Surface

The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

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This paper deals with the characteristics of partial discharge (PD) in green gas for a grid (g3), which is thought to be a promising eco-friendly

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Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

Sulfur hexafluoride (SF6) is used as a gas medium in gas-insulated O2, N2, CF4, and Ar, plasma, and so forth are used to etch the

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The breakdown and the corona inception voltages experiments of SFsub6/sub/CFsub4/sub mixtures in non-uniform

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These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

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Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in 2,2,4-Trimethylpentane at

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

of CF3I-CO2 gas mixtures as an alternative to SF6 in MV

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Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

characteristics of SF6-N2 and SF6-CF4 gas mixtures |

2017101-We use cookies to make interactions with our website easy and meaningful, on the insulation characteristics of SF6-N2 and SF6-CF4 gas mi

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