Electron swarm coefficients in SF6 and CF4 gas mixtures from

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Highly symmetrical molecules such as CH4, CF4 or SF6 are known to be atmospheric pollutants and greenhouse gases. High-resolution spectroscopy in the

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Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase

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TRAFAG SF6 CF4 SF6_

Last modification on : Thursday, February 7, 2019 - 4:56:13 PMReactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2

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for separation of SF6 from CF4 /air-containing gas stream

2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

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spark decomposition of SF6 and 50% SF6 + 50% CF4 mixtures

on the spark decomposition of SF6 and 50% SF6 + 50% CF4 mixturesThe gaseous by-products , , , , , , and were assayed by gas

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These breakers utilize a gas mixture of SF6 and CF4 or SF6 and N2 to prevent condensation of the SF6 gas and have been type tested at -50oC to

characteristics of SF6-N2 and SF6-CF4 gas mixtures |

2017101-(averages over the edfs) in pure gases or gas mixtures over a range of(DS) in SF6 and CF4 gases at the level of the two-term approximatio

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SF_6-CO_2SF_6-CF_4-

The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

of Si and WSiN using ECR plasma of SF6-CF4 gas mixture

Anisotropic etching of Si and WSiN using ECR plasma of SF6-CF4 gas mixture on ResearchGate, the professional network for scientists. Anisotropic etchin

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Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

Sulfur hexafluoride (SF6) is used as a gas medium in gas-insulated whereas CF4- and SF6-treated CNTs are highly ive to NH3 to

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CFCN/N

The films deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

(GIL)

The characteristics of Si etching with electron cyclotron resonance (ECR) plasma of SF6–CF4 are studied in order to improve anisotropy in dry etching

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We use a binary gas mixture Monte Carlo simulation model to calculate the electron transport parameters in SF6/CF4 mixtures in uniform electric fields

in 50%SF6-50%CF4mixtures at 1 atm -

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

Solubility of Gases in Liquids. 20. Solubility of He, Ne, Ar,

CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, and appropriate molecular and/or bulk properties of the gases and n-

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Comparison of SF6 and CF4 Plasma Treatment for Surface Hydro

which was explained by the full dissociation of the SF6 and CF4 gases,interactions using electron beam-generated plasmas produced in Ar/SF6 mixtures

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The Solubility of Gases in Liquids 9. Solubility of He, Ne,

CO2, CH4, CF4, and SF6 in some Dimethylcyclohexanes at 298 to 313 Kmixtures of cis-+ trans-1,3-dimethylcyclohexane and cis- + trans-1,4-